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Simulation Study and Comparative Analysis of Some TFET Structures with a Novel Partial-Ground-Plane (PGP) Based TFET on SELBOX Structure

dc.contributor.authorSingh, A.K.
dc.contributor.authorTripathi, M.R.
dc.contributor.authorChander, S.
dc.contributor.authorBaral, K.
dc.contributor.authorSingh, P.K.
dc.contributor.authorJit, S.
dc.date.accessioned2020-11-20T10:20:46Z
dc.date.available2020-11-20T10:20:46Z
dc.date.issued2020-10-01
dc.description.abstractThis paper proposes a novel TFET structure namely gate stacked (GS) heterojunction (HJ) partial-ground-plane (PGP) TFET with SELBOX (GSHJ-PGP-STFET) for improving the ON/OFF-state current ratio of the TFET by reducing the OFF-state current while maintaining the ON-state current nearly unaffected. Here we have done a comparative analysis of fully depleted SOI TFET and TFET on SELBOX structure with our proposed device. An extensive TCAD based simulation study has been carried out for investigating the effect of temperature on the subthreshold swing (SS), transfer characteristics, threshold voltage, and ION/IOFF ratio of the given TFET structures. The ION/IOFF ratio and SS are found to be ~1011 and 47 mV/dec respectively which is better over other two structures. Also, the proposed TFET device has improved reliability in terms of smaller effect of temperature on the performance of GSHJ-PGP-STFET as compared to the conventional SELBOX and FD-SOI TFET structures. © 2019, Springer Nature B.V.en_US
dc.identifier.issn1876990X
dc.identifier.urihttps://idr-sdlib.iitbhu.ac.in/handle/123456789/959
dc.language.isoen_USen_US
dc.publisherSpringeren_US
dc.relation.ispartofseriesSilicon;Vol. 12 Issue 10
dc.subjectSilicon on insulator (SOI)en_US
dc.subjectBand-to-band tunneling (BTBT)en_US
dc.subjectTunnel field effect transistor (TFET)en_US
dc.subjectSelective buried oxide (SELBOX)en_US
dc.titleSimulation Study and Comparative Analysis of Some TFET Structures with a Novel Partial-Ground-Plane (PGP) Based TFET on SELBOX Structureen_US
dc.typeArticleen_US

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