Field-ion microscopic study of antiparallel twins in Ni4Mo
| dc.contributor.author | Chandrasekharaiah M.N.; Ranganathan S.; Okamoto P.R.; Thomas G. | |
| dc.date.accessioned | 2025-05-24T09:58:15Z | |
| dc.description.abstract | Ni4Mo undergoes an order-disorder transformation giving rise to three types of domain boundaries. The field-ion image contrast from one such interface, namely the antiparallel twin boundary, has been studied using computer simulation. Evidence is presented for this effect from the field-ion images of Ni4Mo. © 1972. | |
| dc.identifier.doi | https://doi.org/10.1016/0025-5408(72)90064-5 | |
| dc.identifier.uri | http://172.23.0.11:4000/handle/123456789/23106 | |
| dc.relation.ispartofseries | Materials Research Bulletin | |
| dc.title | Field-ion microscopic study of antiparallel twins in Ni4Mo |