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Field-ion microscopic study of antiparallel twins in Ni4Mo

dc.contributor.authorChandrasekharaiah M.N.; Ranganathan S.; Okamoto P.R.; Thomas G.
dc.date.accessioned2025-05-24T09:58:15Z
dc.description.abstractNi4Mo undergoes an order-disorder transformation giving rise to three types of domain boundaries. The field-ion image contrast from one such interface, namely the antiparallel twin boundary, has been studied using computer simulation. Evidence is presented for this effect from the field-ion images of Ni4Mo. © 1972.
dc.identifier.doihttps://doi.org/10.1016/0025-5408(72)90064-5
dc.identifier.urihttp://172.23.0.11:4000/handle/123456789/23106
dc.relation.ispartofseriesMaterials Research Bulletin
dc.titleField-ion microscopic study of antiparallel twins in Ni4Mo

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