Swift heavy ion irradiation induced texturing in NiO thin films

dc.contributor.author	Mallick P.; Agarwal D.C.; Rath C.; Biswal R.; Behera D.; Avasthi D.K.; Kanjilal D.; Satyam P.V.; Mishra N.C.
dc.date.accessioned	2025-05-24T09:55:43Z
dc.description.abstract	NiO thin films grown on Si(1 0 0) substrate by electron beam evaporation and sintered at 500 and 700 °C were irradiated with 120 MeV Au9+ ions. The FCC structure of the sintered films was retained up to the highest fluence (3 × 1013 ions cm-2) of irradiation. In the low fluence (≤1 × 1013 ions cm-2) regime however, the evolution of the XRD pattern with fluence showed a wide variation, critically depending upon their initial microstructure. Though irradiation is known to induce disorder in the structure, we observe improvement in crystallization and texturing at intermediate fluences of irradiation. © 2008 Elsevier B.V. All rights reserved.
dc.identifier.doi	https://doi.org/10.1016/j.nimb.2008.04.013
dc.identifier.uri	http://172.23.0.11:4000/handle/123456789/20144
dc.relation.ispartofseries	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
dc.title	Swift heavy ion irradiation induced texturing in NiO thin films

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