Reversible phase transition in vanadium oxide films sputtered on metal substrates

dc.contributor.author	Palai D.; Carmel Mary Esther A.; Porwal D.; Pradeepkumar M.S.; Raghavendra Kumar D.; Bera P.; Sridhara N.; Dey A.
dc.date.accessioned	2025-05-24T09:27:22Z
dc.description.abstract	Vanadium oxide films, deposited on aluminium (Al), titanium (Ti) and tantalum (Ta) metal substrates by pulsed RF magnetron sputtering at a working pressure of 1.5 x10−2 mbar at room temperature are found to display mixed crystalline vanadium oxide phases viz., VO2, V2O3, V2O5. The films have been characterized by field-emission scanning electron microscopy, X-ray diffraction, differential scanning calorimetry (DSC) and X-ray photoelectron spectroscopy, and their thermo-optical and electrical properties have been investigated. Studies of the deposited films by DSC have revealed a reversible-phase transition found in the temperature range of 45–49 °C. © 2016 Informa UK Limited, trading as Taylor & Francis Group.
dc.identifier.doi	https://doi.org/10.1080/09500839.2016.1247993
dc.identifier.uri	http://172.23.0.11:4000/handle/123456789/16146
dc.relation.ispartofseries	Philosophical Magazine Letters
dc.title	Reversible phase transition in vanadium oxide films sputtered on metal substrates

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