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Investigation of surface potential for double gate hetero junction tunnel FinFET: Application to high-& material HfO2

dc.contributor.authorDixit B.; Maitya N.P.; Dikshit A.; Tiwari S.; Ankush; Rana J.S.; Kumar V.
dc.date.accessioned2025-05-24T09:32:15Z
dc.description.abstractTunnel FETs (TFETs) shown to be the promising devices for low standby power applications but suffers from low ON and high threshold voltage. The hetero junction tunnel FinFET has been studied here to overcome these limitations. In this work, surface potential has been modeled for double gate hetero junction tunnel FinFET to optimize the performance. Surface potential derived by applying the solution of 2-D Poisson equation and it is developed using superposition technique. The high-& dielectric material HfO2 on the surface potential model is also addressed. The analytical predictions are compared with the results obtained by the 2-D numerical techniques and Technology Computer Aided Design (TCAD) simulator (Synopsys TCAD), the obtained results are almost similar. © 2018 IEEE.
dc.identifier.doihttps://doi.org/10.1109/ISDCS.2018.8379663
dc.identifier.urihttp://172.23.0.11:4000/handle/123456789/17898
dc.relation.ispartofseries2018 International Symposium on Devices, Circuits and Systems, ISDCS 2018
dc.titleInvestigation of surface potential for double gate hetero junction tunnel FinFET: Application to high-& material HfO2

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