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Large area vertically oriented few-layer mos2 for efficient thermal conduction and optoelectronic applications

dc.contributor.authorMajee B.P.; Bhawna; Singh A.; Prakash R.; Mishra A.K.
dc.date.accessioned2025-05-23T11:30:38Z
dc.description.abstractLarge area growth of MoS2 can show great advances in optoelectronic devices due to its unique optical and electronic properties. Here, we directly grow vertically oriented and interconnected few-layer MoS2 over 1 × 1 cm2 of p-Type Si substrate using CVD technique. We report for the first time the thermal conductivity of vertically oriented few-layer (VFL) MoS2 using the optothermal Raman technique. The reduced phonon-defect scattering due to minimal defects and strains in VFL MoS2 results in excellent thermal conductivity of 100 ± 14 W m-1 K-1 at room temperature. The photoluminescence and DFT study confirm the semiconducting behavior of VFL-MoS2. The VFL-MoS2/Si photodiode shows high photoresponsivity of 7.37 A W-1 at-2.0 V bias under 0.15 mW cm-2 intensity of 532 nm laser. The enhanced light trapping and highly exposed edges of VFL MoS2 due to vertical orientation, formation of efficient p-n junction at the MoS2/Si interface and effective charge separation leads to the excellent performance of grown VFL-MoS2 for optoelectronic applications. Copyright © 2020 American Chemical Society.
dc.identifier.doihttps://doi.org/10.1021/acs.jpclett.9b03726
dc.identifier.urihttp://172.23.0.11:4000/handle/123456789/12400
dc.relation.ispartofseriesJournal of Physical Chemistry Letters
dc.titleLarge area vertically oriented few-layer mos2 for efficient thermal conduction and optoelectronic applications

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