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The formation mechanism for printed silver-contacts for silicon solar cells

dc.contributor.authorFields, Jeremy D.
dc.contributor.authorAhmad, Md. Imteyaz
dc.contributor.authorPool, Vanessa L.
dc.contributor.authorand et al
dc.date.accessioned2020-02-25T07:05:14Z
dc.date.available2020-02-25T07:05:14Z
dc.date.issued2016-04-01
dc.description.abstractScreen-printing provides an economically attractive means for making Ag electrical contacts to Si solar cells, but the use of Ag substantiates a significant manufacturing cost, and the glass frit used in the paste to enable contact formation contains Pb. To achieve optimal electrical performance and to develop pastes with alternative, abundant and non-toxic materials, a better understanding the contact formation process during firing is required. Here, we use in situ X-ray diffraction during firing to reveal the reaction sequence. The findings suggest that between 500 and 650 °C PbO in the frit etches the SiNx antireflective-coating on the solar cell, exposing the Si surface. Then, above 650 °C, Ag+ dissolves into the molten glass frit-key for enabling deposition of metallic Ag on the emitter surface and precipitation of Ag nanocrystals within the glass. Ultimately, this work clarifies contact formation mechanisms and suggests approaches for development of inexpensive, nontoxic solar cell contacting pastes.en_US
dc.identifier.issn20411723
dc.identifier.urihttps://idr-sdlib.iitbhu.ac.in/handle/123456789/656
dc.language.isoen_USen_US
dc.publisherNature Publishing Groupen_US
dc.subjectsiliconen_US
dc.subjectphotovoltaic systemen_US
dc.subjectsolar poweren_US
dc.subjectformation mechanismen_US
dc.subjectsilicon solar cellen_US
dc.titleThe formation mechanism for printed silver-contacts for silicon solar cellsen_US
dc.typeArticleen_US

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